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The heat treating furnaces with electric resistance heating and chamber system are suitable for melting, annealing and heat treating of various materials in a temperature of max. 1100 °C.
The equipment can be used for industrial and laboratory purposes.

The compact furnace includes every component.
Underneath the heating chamber is an electrical switch, control unit suitable for PID-type programmable temperature control.
Power semiconductor switches are applied.

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Laboratory furnaces

The heat treating furnaces with electric resistance heating and chamber system are suitable for melting, annealing and heat treating of various materials in a temperature of max. 1100 °C. The equipment can be used for industrial and laboratory purposes. The compact furnace includes every component. Underneath the heating chamber is an electrical switch, control unit suitable for PID-type programmable temperature control. Power semiconductor switches are applied.

Type W H D  liter power in kW V
LK-1 170 100 180 3 2 230
LK-2 170 100 240 4 2,5 230
LK-3 170 100 360 6 3 230

Specifications are for informational purposes only and may vary depending on the circumstances of the application.